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Growth and Characterization of Electroplated NiO Coatings

Bibliographic Data

ID19518401
AuthorsB Bharathi (0000-0001-9531-1300), S Thanikaikarasan (0000-0003-0305-2925), Pratap Kollu (0000-0001-6250-9396, Indian Institute of Technology Bombay), P V Chandrasekar (Fuzhou University), T Mahalingam (Ajou University), Luis Lxtlilco (Universidad Autónoma de Guerrero)
Year2014
Volume17
Issue3
Pages173-177
Publication date2014-10-03
Open AccessNo
TypeARTICLE
VenueNew Materialisms (JOURNAL)
Journal identifiersISSN: 1480-2422 • E-ISSN: 2292-1168
PublisherJournal of New Materials for Electrochemical Systems (PUBLISHER)
DOI10.14447/jnmes.v17i3.418
OpenAlexW2889240218
LanguageEN

Thin films of NiO have been prepared using potentiostatic electrodeposition technique from an aqueous electrolytic bath containing NiSO4. Deposited films have been characterized using x-ray diffraction, scanning electron microscopy and energy dispersive analysis by x-rays. X-ray diffraction patterns showed that the prepared films possess polycrystalline nature with face centered cubic structure. Surface morphology and film composition showed that films with better stoichiometry and smooth surface are obtained at optimized growth condition. Optical absorption analysis showed that the prepared films possess direct band gap value around 3.46 eV

Aqueous solution · Band gap · Composite material · Crystallite · Diffraction · Electroplating · Metallurgy · Nanotechnology · Non-blocking I/O · Optics · Optoelectronics · Physical chemistry · Scanning electron microscope · Stoichiometry · Thin film · Chemical Engineering · Chemistry · Gas Sensing Nanomaterials and Sensors · Materials Science · Transition Metal Oxide Nanomaterials

Highly citedNo

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