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D5.3 - Electrical Characterization of the SiO2/4H-SiC Interface

Bibliographic Data

ID5955686
AuthorsC Nanjappan, Georg Pfusterschmied (0000-0003-3810-7770), Ulrich Schmid (0000-0001-9831-8583)
Year2023
Pages235-236
Publication date2023-01-01
Peer ReviewedYes
Open AccessNo
TypeARTICLE
VenueLectures (BOOK_SERIES)
Journal identifiersISSN: 2116-5289 • E-ISSN: 2116-5289
PublisherOpenEdition Journals (PUBLISHER)
DOI10.5162/smsi2023/d5.3
OpenAlexW4382022227
LanguageEN

Characterization (materials science · Composite material · Interface (matter · Nanotechnology · Optoelectronics · Computer Science · Copper Interconnects and Reliability · Materials Science · Silicon Carbide Semiconductor Technologies · Thin-Film Transistor Technologies

Citation velocityhistorical
Highly citedNo

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