P Jeyakumar
Biographic Data
| ID | 8992726 |
|---|---|
| NAME | P Jeyakumar |
| GIVEN NAMES | P |
| FAMILY NAME | Jeyakumar |
| SIGNATURE | JEYAKUMAR P |
| ORCID | 0000-0002-7270-1725 |
| VERIFIED | Yes |
| TOTAL WORKS | 1 |
| TOTAL CITATIONS | 0 |
| WORKS AS AUTHOR | 1 |
| WORKS AS EDITOR | 0 |
| FIRST PUBLICATION YEAR | 2018 |
| LATEST PUBLICATION YEAR | 2018 |
| H-INDEX | 0 |
Growth of Copper Telluride Thin Films using Electrodeposition
Copper Telluride thin films have been prepared on Fluorine doped Tin Oxide coated conducting glass substrates using electrodeposition technique. Cyclic voltammetric analysis has been carried out to analyze the growth mechanism of the deposited films. Thickness value of the deposited films has been estimated using Stylus profilometry. X-ray diffraction pattern revealed that the prepared films possess polycrystalline in nature. Microstructural para…
No prominent works on this page.
Growth of Copper Telluride Thin Films using Electrodeposition
Copper Telluride thin films have been prepared on Fluorine doped Tin Oxide coated conducting glass substrates using electrodeposition technique. Cyclic voltammetric analysis has been carried out to analyze the growth mechanism of the deposited films. Thickness value of the deposited films has been estimated using Stylus profilometry. X-ray diffraction pattern revealed that the prepared films possess polycrystalline in nature. Microstructural para…
Advanced Semiconductor Detectors and Materials (1 work) · Band gap (1 work) · Chalcogenide Semiconductor Thin Films (1 work) · Chemistry (1 work) · Copper (1 work) · Copper oxide (1 work) · Crystallite (1 work) · Diffraction (1 work) · Doping (1 work) · Materials Science (1 work)