P D Jeyakumar
Biographic Data
| ID | 9116584 |
|---|---|
| NAME | P D Jeyakumar |
| GIVEN NAMES | P D |
| FAMILY NAME | Jeyakumar |
| SIGNATURE | JEYAKUMAR P D |
| AFFILIATIONS | Government of Tamil Nadu |
| ORCID | 0000-0003-0298-9468 |
| VERIFIED | Yes |
| TOTAL WORKS | 2 |
| TOTAL CITATIONS | 0 |
| WORKS AS AUTHOR | 2 |
| WORKS AS EDITOR | 0 |
| FIRST PUBLICATION YEAR | 2015 |
| LATEST PUBLICATION YEAR | 2018 |
| H-INDEX | 0 |
Growth of Copper Telluride Thin Films using Electrodeposition
Copper Telluride thin films have been prepared on Fluorine doped Tin Oxide coated conducting glass substrates using electrodeposition technique. Cyclic voltammetric analysis has been carried out to analyze the growth mechanism of the deposited films. Thickness value of the deposited films has been estimated using Stylus profilometry. X-ray diffraction pattern revealed that the prepared films possess polycrystalline in nature. Microstructural para…
Synthesis and Functionalization of L, DL-Iso, Nor, Leucine on Porous Silicon for Sensing Application
The etching process of Porous Silicon has been carried out using an electrochemical oxidation technique. Oxidized samples were immobilized with -Leucine, DL-Iso Leucine and DL-Nor Leucine solutions. Surface morphology and optical properties of the samples have been analyzed using scanning electron microscopy and optical absorption analysis techniques respectively. The bonding characteristics on the surface before and after amino acid deposition h…
No prominent works on this page.
Synthesis and Functionalization of L, DL-Iso, Nor, Leucine on Porous Silicon for Sensing Application
The etching process of Porous Silicon has been carried out using an electrochemical oxidation technique. Oxidized samples were immobilized with -Leucine, DL-Iso Leucine and DL-Nor Leucine solutions. Surface morphology and optical properties of the samples have been analyzed using scanning electron microscopy and optical absorption analysis techniques respectively. The bonding characteristics on the surface before and after amino acid deposition h…
Growth of Copper Telluride Thin Films using Electrodeposition
Copper Telluride thin films have been prepared on Fluorine doped Tin Oxide coated conducting glass substrates using electrodeposition technique. Cyclic voltammetric analysis has been carried out to analyze the growth mechanism of the deposited films. Thickness value of the deposited films has been estimated using Stylus profilometry. X-ray diffraction pattern revealed that the prepared films possess polycrystalline in nature. Microstructural para…
Chemistry (2 works) · Materials Science (2 works) · Nanotechnology (2 works) · Optoelectronics (2 works) · Advanced Semiconductor Detectors and Materials (1 work) · Analytical Chemistry and Sensors (1 work) · Band gap (1 work) · Chalcogenide Semiconductor Thin Films (1 work) · Chemical Engineering (1 work) · Chromatography (1 work)