Luis Ixtlilco

Biographic Data

ID8991520
NAMELuis Ixtlilco
GIVEN NAMESLuis
FAMILY NAMEIxtlilco
SIGNATUREIXTLILCO L
AFFILIATIONSUniversidad Autónoma de Guerrero
VERIFIEDNo
TOTAL WORKS6
TOTAL CITATIONS0
WORKS AS AUTHOR6
WORKS AS EDITOR0
FIRST PUBLICATION YEAR2011
LATEST PUBLICATION YEAR2018
H-INDEX0

  • Growth of Copper Telluride Thin Films using Electrodeposition

    P Jeyakumar, P D Jeyakumar et al.ARTICLENew Materialisms2018

    Copper Telluride thin films have been prepared on Fluorine doped Tin Oxide coated conducting glass substrates using electrodeposition technique. Cyclic voltammetric analysis has been carried out to analyze the growth mechanism of the deposited films. Thickness value of the deposited films has been estimated using Stylus profilometry. X-ray diffraction pattern revealed that the prepared films possess polycrystalline in nature. Microstructural para…

  • Influence of Copper Concentration on the Structural and Optical Properties of Chemically Deposited CuSbS2 Thin Films

    J Joy Jeba Vijila, Kannusamy Mohanraj et al.ARTICLENew Materialisms2016

    Thin films of CuSbS2 have been deposited on ultrasonically cleaned glass substrates using a simple chemical bath deposition technique. Prepared films have been characterized using X-ray diffraction, Field Emission Scanning Electron Microscopy and UV-Vis-NIR spectroscopic techniques, respectively. X-ray diffraction analysis revealed that the prepared films possess polycrystalline in nature with orthorhombic CuSbS2 in addition to secondary phase of…

  • Studies on Electrodeposited NiS Thin Films

    B Bharathi, S Thanikaikarasan et al.ARTICLENew Materialisms2014

    Thin films of NiS have been deposited on indium doped tin oxide coated conducting glass substrates using electrodeposition technique. Structural studies revealed that the deposited films exhibit hexagonal structure with preferential orientation along (002) plane. Structural parameters such as crystallite size, strain and dislocation density are calculated for films with different thickness values obtained at various deposition time. The film comp…

  • Electrochemical Growth and Characterization of Lead Sulphide Thin Films

    S Thanikaikarasan, T Mahalingam et al.ARTICLENew Materialisms2013

    Growth of lead sulphide thin films has been carried out electrochemically on indium doped tin oxide coated conducting glass substrates from an aqueous acidic bath containing Pb(CH3COO)2 and Na2S2O3. X-ray diffraction pattern showed that the deposited films possess cubic structure with most prominent reflection along (200) plane. The dependency of microstructural parameters such as crystallite size, strain and dislocation density with film thickne…

  • Annealing Effects on the Properties of Electrodeposited CdSSe Thin Films

    T Mahalingam, V Dhanasekaran et al.ARTICLENew Materialisms2011

    The effect of post heat treatment on structural, morphological and optical properties of electrodeposited CdSSe solid solution thin films were studied using X-ray diffractometer (XRD), scanning electron microscopy (SEM), and UV-Vis-NIR spectrophotometer, respectively. X-ray diffraction patterns revealed that polycrystalline nature with hexagonal structure of CdSSe thin films. Also the microstructural properties are calculated tends to increase an…

  • Electrosynthesis and Studies on CdZnSe Thin Films

    T Mahalingam, V Dhanasekaran et al.ARTICLENew Materialisms2011

    Electrodeposited CdZnSe thin films have been prepared at various bath temperatures. The thickness of the films was estimated between 850 nm and 1500 nm by stylus method. The X-ray diffraction patterns revealed that the polycrystalline nature with cubic structure of CdZnSe alloy thin films. Microstructural properties such as, crystallite size, dislocation density, microstrain and number of crystallites per unit area were calculated using predomina…